A Study on Influence of Thin Films Through Different Processes of Deposition

Compares the influence of different deposition processes upon properties of thin films produced through ion beam reactive sputter deposition(IBRSD), ion assisted deposition(IAD) using advanced plasma source(IA D -APS), IAD using RF source(IA D -RF), and IAD using Kaufman source(IA D -K) to coat monolayer films and multilayer films of Ta₂O₅ and SiO_2..The results show IBRSD is suitable for laser films with an anti-laser -damage value of 17.39J·cm^-2. IA D -APS and IA D -RF can fabricate high quality films with compact structure, low scattering, and low absorption. Properties of films from IA D -K was found to be relatively less satisfactory.