Wan Minli Lin Yongchang. A Mathematical Model for Optical Films Deposited by Reactive Ion PlatingJ. Transactions of Beijing institute of Technology, 1993, (1): 23-31.
Citation:
Wan Minli Lin Yongchang. A Mathematical Model for Optical Films Deposited by Reactive Ion PlatingJ. Transactions of Beijing institute of Technology, 1993, (1): 23-31.
Wan Minli Lin Yongchang. A Mathematical Model for Optical Films Deposited by Reactive Ion PlatingJ. Transactions of Beijing institute of Technology, 1993, (1): 23-31.
Citation:
Wan Minli Lin Yongchang. A Mathematical Model for Optical Films Deposited by Reactive Ion PlatingJ. Transactions of Beijing institute of Technology, 1993, (1): 23-31.
A Mathematical Model for Optical Films Deposited by Reactive Ion Plating
The formation of plasma sheath and the floating potential of substrate are analysed by plasma theory. The condition of ion incident upon the substrate through potential hill, the floating potential of substrate, the ion incidence energy and density on the substrate are calculated. Thus a mathematical model for optical films deposited by the reactive ion plating process is built up.
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