Fractal Theory and Fractal Aggregation in Amorphous Silicon Films

Introduction of the fractal concept is followed by its application in the analysis of the micorstruture of amorphous silicon ( a - Si: H) films. Morphology of fractal structure in hydrogenated amorphous silicon ( a - Si: H) films at different annealing temperatures was observed using TEM. The experimental method adopted is an in situdynamic observation technique. The fractal dimension is calculated with the Sandbox method and the interralationship function method. The results show that the fractal structures in a - Si: H films are in close relationship with the characterization of the films. The relationship between the fractal structures in a - Si: H films and its crystallization are discussed.