Abstract: Compares the influence of different deposition processes upon properties of thin films produced through ion beam reactive sputter deposition(IBRSD), ion assisted deposition(IAD) using advanced plasma source(IA D -APS), IAD using RF source(IA D -RF), and IAD using Kaufman source(IA D -K) to coat monolayer films and multilayer films of Ta₂O₅ and SiO_2..The results show IBRSD is suitable for laser films with an anti-laser -damage value of 17.39J·cm^-2. IA D -APS and IA D -RF can fabricate high quality films with compact structure, low scattering, and low absorption. Properties of films from IA D -K was found to be relatively less satisfactory.